NSCore's PermSRAM®是一個高速和高密度非揮發性記憶體巨集,使用標準互補式金屬?化物製程,不需要額外光罩。
| PermSRAM® | Laser Fuse | Pory eFuse | Cap eFuse | FG-NVM (eMemory) |
|
|---|---|---|---|---|---|
| Program scheme | HC injection | Laser power | Current power | Current power | HC injection |
| Programmed information |
Trapped charge | Resistance change | Resistance change | Resistance change | Floating charge |
| Field programmable |
Yes | No | No | No | Yes |
| Scalability | Good | Bad | Bad | Good | Fair |
| Additional process |
No | Fuse window | No | No | No |
| Program voltage | 4-5V | - | 5-7V | 5-8V | 6-7V |
| Program current | < 100uA | - | 1-10mA | 100-1000uA | 150uA |
| Program time | < 10us/bit | 100ms/bit | 10ms/bit | 10-100us/bit | 100us/bit |
PermSRAM®的使用範圍廣泛,包含以下所列應用:
Silicon-proven IPs 所有以下要點是可利用於晶圓廠的 0.18微米, 0.13微米, 90奈米和 65奈米製程.

